Plasma Generation by RF Penning Discharge in Comparison with ECR Discharge for Surface Cleaning
Cherenshchykov, Sergiy; Solodovchenko, Sergiy; Shtan, Anatoliy; Ryzhkov, Ivan
Ukraine

At processes of discharge cleaning of surfaces a requirement of low energy of ions of a bombarding surface is usual (approximately no more than 100 eV). However in glow discharges of a direct current and high-frequency discharges these requirements usually are not carried out by specific conditions of excitation and support the discharges. For lower energy of ions a microwave electron cyclotron resonance (ECR) discharge is frequently used. A two-anode Penning discharge with an additional high frequency feeding [1] is also characterised by small voltage of ignition. As against of ECR discharge the discharge does not require application of microwave devices. A certain value of a magnetic field connected to frequency of the used generator. The input of high-frequency energy becomes simpler. Experiments were made with use mirror magnetic trap facility [2] . The comparative characteristics of ignition and maintenance of both types of the discharges are resulted. The characteristics of formed plasma are compared also. [1] S.A. Cherenshchykov. “A low-voltage Penning cell for vacuum measurement and vacuum technology.” Vacuum , Elsevier, Volume 73, Issue 2, 19 March 2004, Pages 285-289 [2] A.F. Bardamid, V.T. Gritsyna, V.G. Konovalov,et all “Ion energy distribution effect on degradation of optical properties of ion-bombarded copper mirrors” Surface and Coating Technology, Elsevier, Volume 103-104, May 1998, Pages 365-369
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