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A high current pulsed cathodic arc has been used for the synthesis of ceramic thin films and ternary alloys, where multiple cathodes enable film growth with predefined nanostructure and composition. MAX phase thin films, primarily Ti2AlC, have been deposited by by means of alternating plasma pulses of sub-monolayer amounts of material, resulting in the 211 composition. Hence, together with substrate heating, control of composition as well as structure is achieved. Film characterization includes structural analysis with TEM and XRD (including in situ heating), and hardness measurements with nanoindentation. The results show epitaxial film growth, as well as a structure and hardness dependent on film characteristics such as stoichiometry.
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