Nanoscale molecular patterning on artificially fabricated nanoscale structured Al surfaces | |||
Kato, Hitoshi; Takemura, Susumu; Kimura, Shogo; Okumura, Takayuki; Kobayakawa, Daisuke; Watanabe, Yohei; Sugiyama, Takeharu; Hiramatsu, Tomoyasu; Nanba, Noriyuki; Nishikawa, Osamu; Taniguchi, Masahiro Japan |