The particular structure of porous silicon (PS), which can be schematically described as a network of silicon nanocristals makes this material to be very suitable for many different applications in a wide variety of fields. On the other hand; FeNi alloys have a variety of high technological applications. Indeed, the deposition and introduction of magnetic group metals (i. e. FeNi alloys) in such PS structure would lead to new potential systems for magnetic memory, storage disk... etc.
In this work, we report on cathodic deposition of tubular Fe20 Ni80 alloy into PS layer formed on n-type Si.
The electrodeposited thin films were characterized by Scanning Electron Microscopy (SEM), Energy Dispersive Spectroscopy (EDS), X, Ray Diffraction (XRD) and Secondary in Mass Spectroscopy (SIMS)
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