The investigation results for the films received by the method of hf-magnetron sputtering (HFMS) of the ceramic target have been presented. The target was made by the single-axis pressing of the hydroxyapatite (HA) powder and the subsequent annealing. The HFSM was performed in an argon atmosphere (1•10-1Pa). The films 0.1...1.0 µm thick were deposited on the surfaces of the polished Ti-foils, the synthetic sapphire (Al2O3) plates, the single-crystals Si(111) and CaF2. For the transmission electron microscopy and X-ray diffraction the thin films (as thin as 0.1 µm) were deposited on the cleaved NaCl crystal or the Ti-foils thinned by ion sputtering, containing the regions transparent for the electron beam. The rate of the film growth was 0.7nm s-1. The phase composition, structure and morphology of the film surface were investigated by the methods of HEED, XRD, IR-spectrometry, TEM SEM and AFM.
Depending on the plasma effect, the thin films (0.1 µm)on the unheated substrates had either the amorphous-crystalline structures with the oxide nanograins (5-10 nm) evenly distributed in the amorphous matrix, or the nanocrystalline structures, corresponding to HA, with the grain size not exceeding 60 nm. The investigation of the films 1.0 µm thick (surface and cross-section) by the XRD and SEM methods have shown that they have a compact nanocrystalline HA structure. The IR-spectrum for the films on CaF2 and Si contains all the main absorption bands characteristic of HA. According to the AFM results, the relief of the film surfaces is in agreement with the size of the HA nanograins. The nanohardness of the films 1 µm thick on Si and Ti is 10-12GPa.
The work was performed under the grant of the Russian Foundation for Basic Research No. 06-08-01112-à.
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