Purpose: Present study characterized the surface chemistry and morphology of commercially available clinical implants, including various surface modification techniques.
Materials and Methods: Tiunit® (Nobelbiocare AB, Sweden), SLA® (Institute Straumann AG, Switzerland), Osseospeed® (Astra AB, Sweden) and Osseotite® (Implant Innovations Inc., USA) were analyzed. XPS (X-ray Photoelectron Spectroscopy) and AES (Auger Electron Spectroscopy) were employed for characterization of surface chemistry and depth profiles of elements, respectively.
Result: Measurements of XPS and AES revealed the common elements of Ti, O and contaminants, and carbon species all over the implants. Carbon contamination levels of Tiunit and SLA implants are less than 35% whilst those of Osseotite and Osseospeed are over 40%. As characteristic elements detected at the as-received surface, P was about 7 at% in Tiunit, 0.27 at% of F in Osseospeed. After 3 second of sputtering, P was detected 9.5 at% in Tiunit but F in Osseospeed was not detected. ASE depth profile of P in Titunit showed about 5.3 at% of P after one minute of sputtering.
Discussion and Conclusions: P distribution of TiUnit as detected by the AES depth profile indicates that anion incorporation continuously occurred during electrochemical oxidation. On the other hand, in the case of Osseospeed the absence of F after three second of sputtering may imply F adsorption on the outmost surface. |