Objective: This study aimed to investigate the effect of Plasma Source Ion Implantation (PSII) with oxygen and magnesium ions on the morphology and chemistry of titanium biomaterials.
Materials and method:
Disc samples of commercially pure titanium were electropolished and followed by PSII treatment. Gas (Oxygen) and metal arc plasma (Mg) was accelerated to titanium substrate by negative voltage (15keV) under high vacuum (10-5~10-6 torr) condition. Surface properties were characterized with Scanning Electron Microscope (SEM), X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES).
Result: SEM pictures of the O PSII and Mg PSII samples showed alterations of morphology at the nanometer level but did not show significant differences at micrometer scale. The roughness values, e.g. RMS (Root Mean Square) were similar as 5.06 nm in Mg PSII and 5.36nm in O PSII. The peak intensities of O1s were detected at 530eV in O PSII and Mg PSII and 530.4eV in the electropolished sample. The peak intensities of Ti 2p3 were detected at 458.5 in O PSII, 458.6eV in Mg PSII and 458.7eV in the electropolished sample. The peak intensity of Mg 2p was detected at 49.9eV in Mg PSII. Relative atom concentration of Mg was characterized as 5.5 at% at the as-received surface, 6.1 at% after six of second sputtering and about 5% after twenty-four second of sputtering and thereafter leveled down.
Conclusion: PSII treatment resulted in alteration of the surface chemistry with no significant changes of morphology and roughness at the micrometer level. |