The application of scanning probe microscopy (SPM) to nanoimprint lithography (NIL) has been verified by using focused ion beam (FIB)-modified commercial silicon tips. In this novel process the tip acts as a mold for the polymer substrate when the temperature is raised above the glass transition temperature (Tg) allowing at the same time imaging on the sample surface before and after the NIL process. One of the main advantages of this approach is related to the fact that the pressure applied to the tip-mold can be controlled during the process by means of the standard SPM force feedback. Moreover, information related to the capillary force acting on the tip/mold can be inferred by monitoring the cantilever deflection during the tip indentation and during its retraction from the polymer film. This information reveals fundamental to study the effect of anti-sticking layers normally employed in NIL with silicon molds having different geometries and depending on the polymers employed. The capability of this technique from alignment point of view will be demonstrated by imprinting on pre-patterned structures. Future applications and developments will be also discussed.