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The ionLiNE workstation is a novel focused ion beam instrument for low dose patterning in surface science, thin film engineering, and applied physics research. The unique components are the patented NanoFIB column and a Laser interferometer stage with 1-nm positioning, all integrated into one system and combined with software enabling advanced ion beam patterning. The ion beam column provides overnight beam current stability as required for advanced and automated patterning down to a sub ten nanometer level. Low beam tails offer high lateral selectivity. For applications covering larger areas, a Laser interferometer controlled stage is an integrated part of the ionLiNE workstation. It offers a unique positioning of 1 nm, under digital and manual control, and specifications like overlay and stitching, well known for high-end patterning tools. The software used for advanced ion beam patterning includes the generation or import of complex patterns in the widely accepted GDSII data format. Exposures are made in vector scan mode using the high speed 16 bit pattern generator. The pattern generator technology enables nanosecond ion dose control and moreover straightforward 3D grey level patterning capabilities. Job automation for overnight patterning requires no intermediate user interaction, secured by automated focus control using height sensing schemes and an automated dose correction control. A continuous - zero stitching - writing mode for seamless exposure of extended structures - FBMS mode - complements the advanced patterning of ionLiNE. |