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An UHV Chamber for preparation of nanomaterials by inert gas condensation technique is available in the Department of Nuclear Physics, University of Madras, Chennai, India. Currently Joule heating technique is being used for this purpose. In order to overcome the limitations of Joule heating, RF/DC magnetron three target sputtering gun with DC and RF power supplies has been designed for mounting on CF150 flange and developed with the help of M/s. Elettrorava s.p.a, Italy. The diameter of each target is 50 mm dia. and 6 mm thick. Copper nanopowder was deposited at DC power around 850 W with 100 mbar Argon atmosphere with a rate of 2 gm per hour and sealed under Argon atmosphere. The design of powder collection unit will also be discussed. |