|
Titanium dioxide films for optical applications were deposited on large area glass substrates by reactive mid-frequency (MF) magnetron sputtering. The preparation of the films was performed on a vertical in-line coating system which was designed for optical multi-layer coatings. In order to abtain a high deposition rate, the depositions were carried out in the ì®transition regionì— stably by taking the method of plasma emission monitor (PEM) control. The structural and optical properties of the films deposited with various deposition parameters were investigated. X-ray diffraction patterns showed that the films deposited at substrate temperature above 200ìæ showed anatase polycrystalline structure, and the crystallinity increased with increasing optical plasma emission intensity (OEI) of Ti at the wavelength of 500 nm. The films morphology was investigated by SEM and AFM. It was shown that the films had a homogenous microstructure. The optical properties were measured and calculated by spectrophotometer and thin-film analyzer. The films had good optical property, including satisfying refractive index and extinction coefficient All of these enable it a promising material for optical applications. A double four-layer(SiO2/TiO2/SiO2/TiO2/glass/TiO2/SiO2/TiO2/SiO2) and a double six-layer(SiO2/TiO2/SiO2/TiO2/SiO2/TiO2/glass/TiO2/SiO2/TiO2/SiO2/TiO2/SiO2) anti-reflective coatings were performed on glass substrates with a maximum size of 1600×900 mm2. Their optical performances and the uniformities both reached a good level. |