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Non-thermal plasma is used as a source of exited particles (atoms, radicals, ions) in various technological applications – for material deposition, etching, surface modification, etc. Usually, these processes are performed under low pressure and require expensive vacuum equipment. Another drawback consists in relatively low reaction product yield limited by low concentrations of precursors. In this work, we investigate a promising technology of synthesis of nano-powders in non-thermal atmospheric-pressure plasmas of low-frequency or RF gas discharge. Nano-powders of SiO2 and TiO2 are produced by chemical vapor deposition process from metalorganics source. In comparison with low-pressure techniques, precursor concentrations in atmospheric-pressure plasma are higher by approximately 3 orders of magnitude, which must result in the corresponding increase of probability of homogeneous reactions leading to formation of nano-particles. The reaction products will be characterized by SEM, TEM, X-ray and microanalysis methods. Gas discharge parameters will be optimized on the basis of combined optical and probe diagnostics. |