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Atom reactions with organic surfaces and thin films are an important component of many vacuum based processes used to tailor interfacial properties and etch organic materials. To develop a better, more molecular level, understanding of these surface reactions we have used a combination of X-ray Photoelectron Spectroscopy (XPS), contact angle measurements and Atomic Force Microscopy (AFM) to study the interaction of atomic oxygen (AO) and atomic hydrogen (AH) with organized thin film assemblies created by self assembled monolayers. In this presentation I will describe:
1. The advantages and disadvantages of SAMs as models for polymeric interfaces and organic thin films.
2. The influence that film thickness and chemical composition play in moderating the modification processes. In the case of atomic oxygen reactions with semi-fluorinated SAMs, an induction period is observed prior to the onset of chemical modification.
3.The well-defined correlations that exist between changes in the chemical composition that occur during modification processes and the corresponding changes in the SAM’s physical properties.
In general our results highlight the surprisingly selective nature of atom reactions with organized thin assemblies.
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