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Optical Emission spectroscopy (OES) is a powerful tool for determining plasma characteristics in situ. Normally, the experimental implementation is easy, but the spectra analysis is complex because it is necessary to carry out manually almost many different task and it has many steps and takes much time. In this work it is proposed an automatic extraction of characteristics from spectra taking in TiN and TiAlN coating production employing the magnetron sputtering technique. The first step consisted in determining automatically the wavelength of peaks and them, from data bases, the identification of chemical element for each peak were realized. After that, the software allows to determine peaks characteristics such as intensity, FWHM continuous, and profile have been extracted. With these values, electronic density and temperature of plasma, employing spectroscopic methods such as line to line ratio, line to continuous ratio and Stark broadening. Moreover, a graphic interface was built allowing the calculation was easier. |