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Synchrotron x-rays, with its high flux, brightness, tunability, polarization control, and time-structure, provides a unique and valuable probe for characterizing advanced materials. In this presentation, recent development of synchrotron techniques and their applications to materials research related to microelectronics industry at the NSLS will be reviewed. Examples include: time-resolved x-ray scattering study of materials growth and processing, high energy photoemission study of buried interfaces in the development of high-k dielectrics, anomalous x-ray scattering study of structure and strain in ultra-thin magnetic films, magnetic scattering study of magnetic switching dynamics and interfaces, and x-ray microbeam study opto-electronics devices. Plans for new beamlines at the NSLS as well as the design and performance of the proposed new synchrotron, NSLS-II, will also be discussed. |