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Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) have been productive tools for a large variety of scientific and technological purposes since commercial instruments became available almost 40 years ago. Elemental identification is relatively easy but quantitative measurements (e.g., identification of chemical state, determination of chemical composition, and measurement of film thicknesses) can be more difficult. I will give an overview of advances that have been made to calibrate instruments, assess surface sensitivity, account for elastic scattering of the signal electrons, measure peak intensities, and determine film thicknesses. Examples will also be given of the use of NIST databases and other resources to improve the reliability and efficiency of quantitative AES and XPS analyses. |